Mitigation of substrate coupling effects in RF switch by localized substrate removal using laser processing

Archive ouverte : Pré-publication, document de travail, ...

Bhaskar, Arun | Philippe, Justine | Okada, Etienne | Braud, Flavie | Robillard, J.F. | Durand, Cédric | Gianesello, Frédéric | Gloria, Daniel | Gaquière, Christophe | Dubois, Emmanuel

Edité par HAL CCSD

With the evolution of radio frequency (RF)/microwave technology, there is a demand for circuits which are able to meet highly challenging RF frontend specifications. Silicon-on-insulator (SOI) technology is one of the leading platforms for upcoming wireless generation. The degradation of performance due to substrate coupling is a key problem to address for telecommunication circuits, especially for the high throw count switches in RF frontends. In this context, a novel technique for local substrate removal is developed to fabricate membranes of mm-sized RF switch which allows for total etching of silicon handler. RF characterization of membranes reveal a superior linearity performance with lowering of 2 nd harmonic by 17.7 dB and improvement in insertion losses by 0.38 dB in comparison with High-Resistivity SOI substrates. This improvement leads to a significant increase in frontend efficiency. These results demonstrate a new route for optimization of circuit performance using post-fabrication substrate processing techniques.

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